I recommend the publication of this paper with minor revisions. The authors address the challenges of constructing micro- and nano-scale supercapacitor devices using focused ion beam (FIB) technology, presenting impressive performance characteristics. However, it is crucial for the authors to provide a detailed explanation in the manuscript regarding the device's capability to perform at high scan rates (10-400 V s-1). Additionally, the reliability of the data obtained using a normal potentialstat at such high rates should be addressed. The results highlight the potential applications of the FIB-fabricated nano-supercapacitor in energy storage, power conditioning, and AC line filtering, emphasizing its significance in the field of nano- and micro-scale technologies.